Investigation of Fabric Behaviour in Bias Extension at Low Loads
Research and development
Authors:
- Naujokaityte Laura
Department of Clothing and Polymer Products Technology, Faculty of Design and Technologies, Kaunas University of Technology, Kaunas, Lithuania - Strazdiené Eugenija (j/w)
- Domsiené Jurgita (j/w)
Tags: shear, critical shear angle, bias extension, buckling, image analysis.