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Using Plasma Metallisation for Manufacture of Textile Screens Against Electromagnetic Fields

Research and development

Authors:

• Ziaja Jan
  Institute of Electrical Engineering Fundamentals, Wrocław University of Technology, Wrocław, Poland
• Koprowska Joanna
  Textile Research Institute, Łódź, Poland
• Janukiewicz Jarosław M.
  3Institute of Telecommunication, Teleinformatics and Acoustics, Wrocław University of Technology, Wrocław, Poland

Full text

Abstract: In this study, a method of the metallisation of polypropylene (PP) nonwovens is presented. The influence of power dissipated in the target on the efficiency of screening a flat electromagnetic wave is discussed. Fabric metallisation was carried out using the standard magnetron sputtering process of Zn-Bi metal targets in argon ambient. A pulse current source with a changing group frequency was used for powering the target. The metallic layers obtained were characterised by good adhesion to PP, with a screening efficiency approaching 45 dB.

Tags: magnetron sputtering, screens against electromagnetic fields, Zn.

Published in issue no 5 (70) / 2008, pages 64–66.